Monday, June 6, 2011: 5:30 PM-8:00 PM
Ontario Exhibit Hall (Detroit Marriott Hotel at the Renaissance Center )
Organizers:
George W. Graham
and
William S. Epling
Effective gold catalysts for NO reduction in exhaust gases
Eunice Vargas, Universidad Autonoma de Baja California;
Elena Smolentseva, Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología;
Miguel Estrada, Posgrado en Física de Materiales, Centro de Investigación Científico y de Educación Superior de Ensenada;
Gabriela Perez, Benemérita Universidad Autónoma de Puebla;
Felipe Castillon, CNYN-Universidad Nacional Autónoma de México;
Sergio Fuentes, Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología;
Andrey Simakov, Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología
Alternative potassium resistant deNOx technologies
Rasmus Fehrmann, Technical University of Denmark;
Steffen B. Kristensen, Technical University of Denmark;
Andreas Jonas Kunov-Kruse, Technical University of Denmark;
Anders Riisager, Technical University of Denmark;
Johannes Due-Hansen, Technical University of Denmark;
Siva Sankar Reddy Putluru, Technical University of Denmark
HYDROGENATION ACTIVITY OF Pt AND PtPd SUPPORTED ON Al-SBA15
J.A. Colin-Luna Sr., UAM-AZC;
A.K. Medina-Mendoza, UAM-AZC;
Jose Escobar, INSTITUTO MEXICANO DEL PETROLEO;
Jose A. De los Reyes Heredia, Universidad Autonóma Metropolitana I.;
Sara Núñez, Universidad Autonoma Metropolitana Unidad Iztapalapa
Methane activation on palladium (-oxide)
Anders Hellman Sr., Chalmers University of Technology;
Adriana Trinchero, Chalmers University of Technology;
Henrik Grönbeck, Chalmers University of Technology;
Johan Gustafson, University of Lund;
Edvin Lundgren, University of Lund;
Jesper N. Andersen, Lund University
Promotion of Ni/Al2O3 for Combined Steam and Carbon Dioxide Reforming of Methane using A Water-pretreatment
In Hyuk Son, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd.;
Young Gil Jo, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd.;
Seung Jae Lee, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd.;
Hyun Chul Lee, Samsung Electronics Co., Ltd