P-Mo-100 In-Situ Infrared Study of the Effect of HCl and H2O on CO2 Adsorption of Silica-Supported Amine

Monday, June 6, 2011
Ontario Exhibit Hall (Detroit Marriott Hotel at the Renaissance Center )
Jak Tanthana, Department of Chemical and Biomolecular Engineering, University of Akron, Akron, OH and Steven Chuang, Chemical Engineering, The University of Akron, Akron, OH
The CO2 capture capacity of silica-supported Tetraethylenepentamine (TEPA/SiO2) is reduced under the presence of excessive HCl and H2O.  HCl reacted with primary and secondary amine of TEPA, producing -NH3+ ion.  H2O injection suggests that the presence of H2O causes the removal of TEPA from the SiO2 surface in molecular form.  

Extended Abstracts: