Catalytic Armoring by Atomic Layer Deposition for the Stabalization of Base Metals in the Liquid Phase

O'Neill, Brandon

Monday, June 3, 2013: 5:00 PM

Combs Chandler (Galt House Hotel)

Brandon O'Neill¹, David Jackson¹, Anthony J. Crisci¹, Carrie A. Farberow¹, Fengyuan Shi¹, Junling Lu², Paul J. Dietrich³, Fabio H. Ribeiro³, Jeffrey T. Miller², Jeffrey W. Elam², Paul Voyles¹, Manos Mavrikakis¹, Jeffrey P. Greeley³, Thomas Kuech¹ and James A. Dumesic¹, (1)University of Wisconsin Madison, USA, (2)Argonne National Laboratory, USA, (3)Purdue University, USA.

Liquid phase reactions are currently limited to precious metals because of their superior stability in high temperature, liquid phase conditions. A new catalytic armoring technique via atomic layer deposition now makes it possible to stabilize even base metal catalysts against irreversible deactivation in the form of sintering and leaching.

Extended Abstracts:

NACS Abstract Cu ALD catalyst_IACT aknowledgment.pdf (59.8KB) - Extended Abstract

O-M-Com-16 Catalytic Armoring by Atomic Layer Deposition for the Stabalization of Base Metals in the Liquid Phase