Abstract: Promoted ZnO/Silica For Wide-temperature-range H<sub>2</sub>S Removal, while Inhibiting COS Formation (21st National Annual Meeting (June 7-12, 2009))

Wednesday, June 10, 2009

Pacific Concourse (Hyatt Regency San Francisco)

Priyanka Dhage , Department of Chemical Engineering, Center for Microfibrous Materials Manufacturing CM3, Auburn University, Auburn, AL

Alexander Samokhvalov , Department of Chemical Engineering, Center for Microfibrous Materials Manufacturing CM3, Auburn University, Auburn, AL

Divya Repala , Department of Chemical Engineering, Center for Microfibrous Materials Manufacturing CM3, Auburn University, Auburn, AL

Eduardus Duin , Department of Chemistry and Biochemistry, Auburn University, Auburn, AL

Bruce J. Tatarchuk , Department of Chemical Engineering, Center for Microfibrous Materials Manufacturing CM3, Auburn University, Auburn, AL

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P-W-93 Promoted ZnO/Silica For Wide-temperature-range H2S Removal, while Inhibiting COS Formation